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P-i-n photodetector with active GePb layer grown by sputtering epitaxy

2024-05-14


Yu, Jiulong; Lin, Guangyang; Xia, Shilong; Huang, Wei; Yang, Tianwei; Jiao, Jinlong; Liu, Xiangquan; Chen, Songyan; Li, Cheng; Zheng, Jun; Li, Jun Source: Applied Physics Express, v 17, n 4, April 1, 2024;

Abstract:

In this paper, single-crystal GePb films were obtained by magnetron sputtering with high substrate temperature and rapid deposition rate. The GePb films have high crystalline qualities and smooth surface. The Pb content reached 1.29% and no segregation was observed. Based on this, a GePb based p-i-n photodetector was successfully prepared. The device showed a RT dark current density of 5.83 mA cm at 1.0 V and a cutoff wavelength of 1990 nm, which covers all communication windows. At the wavelength of 1625 nm, responsivity of the photodetector reached 0.132 A W at 1.0 V. The device demonstrates potential application in optical communications.

© 2024 The Author(s). Published on behalf of The Japan Society of Applied Physics by IOP Publishing Ltd. (34 refs.)




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