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Atomic Mechanism of Strain Alleviation and Dislocation Reduction in Highly Mismatched Remote Heteroepitaxy Using a Graphene Interlayer

2022-06-27

 

Author(s): Liu, BY (Liu, Bingyao); Chen, Q (Chen, Qi); Chen, ZL (Chen, Zhaolong); Yang, SY (Yang, Shenyuan); Shan, JY (Shan, Jingyuan); Liu, ZT (Liu, Zhetong); Yin, Y (Yin, Yue); Ren, F (Ren, Fang); Zhang, S (Zhang, Shuo); Wang, R (Wang, Rong); Wu, M (Wu, Mei); Hou, R (Hou, Rui); Wei, TB (Wei, Tongbo); Wang, JX (Wang, Junxi); Sun, JY (Sun, Jingyu); Li, JM (Li, Jinmin); Liu, ZF (Liu, Zhongfan); Liu, ZQ (Liu, Zhiqiang); Gao, P (Gao, Peng)

Source: NANO LETTERS Volume: 22 Issue: 8 Pages: 3364-3371 DOI: 10.1021/acs.nanolett.2c00632 Published: APR 27 2022

Abstract: Remote heteroepitaxy is known to yield semiconductorfilms withbetter quality. However, the atomic mechanisms in systems with largemismatches are still unclear. Herein, low-strain single-crystalline nitridefilmsare achieved on highly mismatched (similar to 16.3%) sapphire via graphene-assistedremote heteroepitaxy. Because of a weaker interface potential, the in-planecompressive strain at the interface releases by 30%, and dislocations areprevented. Meanwhile, the lattice distortions in the epilayer disappear when thestructure climbs over the atomic steps on substrates because graphene renders thesteps smooth. In this way, the density of edge dislocations in as-grown nitridefilms reduces to the same level as that of the screw dislocations, which is rarelyobserved in heteroepitaxy. Further, the indium composition in InxGa1-xN/GaN multiquantum wells increases to similar to 32%, enabling thefabrication of a yellow light-emitting diode. This study demonstrates the advantages of remote heteroepitaxy for bandgap tuning andopens opportunities for photoelectronic and electronic applications.

Accession Number: WOS:000809056900025

PubMed ID: 35404058

Author Identifiers:

Author        Web of Science ResearcherID        ORCID Number

Zhang, Shuo                  0000-0002-7262-8847

Yang, Shenyuan                  0000-0003-1310-7926

ISSN: 1530-6984

eISSN: 1530-6992

Full Text: https://pubs.acs.org/doi/10.1021/acs.nanolett.2c00632



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