Author(s): Liu, Meijie; Zhu, Yinfang; Zhao, Junyuan; Wang, Lihao; Yang, Jinling; Yang, Fuhua

Source:MICROMACHINES Volume:12 Issue:11 Article Number:1326 DOI:10.3390/mi12111326 Published:NOV 2021

Abstract: This paper presents a simple and reliable routine for batch fabrication of wear-resistant and conductive probe with a PtSi tip. The fabrication process is based on inductively coupled plasma (ICP) etching, metal evaporation, and annealing. Si tips with curvature radii less than 10 nm were produced with good wafer-level uniformity using isotropic etching and thermal oxygen sharpening. The surface roughness of the etched tip post was reduced by optimized isotropic etching. The dependence of the platinum silicide morphology on annealing conditions were also systematically investigated, and conductive and wear-resistant probes with PtSi tips of curvature radii less than 30 nm were batch fabricated and applied for scanning piezoelectric samples.

Accession Number:WOS:000724105700001

eISSN: 2072-666X

Full Text: https://www.mdpi.com/2072-666X/12/11/1326