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Simulations of monolayer SiC transistors with metallic 1T-phase MoS2 contact for high performance application

2021-12-03

 

Author(s): Xie, HQ (Xie, Hai-Qing); Wu, D (Wu, Dan); Deng, XQ (Deng, Xiao-Qing); Fan, ZQ (Fan, Zhi-Qiang); Zhou, WX (Zhou, Wu-Xing); Xiang, CQ (Xiang, Chang-Qing); Liu, YY (Liu, Yue-Yang)

Source: CHINESE PHYSICS B Volume: 30 Issue: 11 Article Number: 117102 DOI: 10.1088/1674-1056/abeee0 Published: NOV 2021

Abstract: We preform a first-principles study of performance of 5 nm double-gated (DG) Schottky-barrier field effect transistors (SBFETs) based on two-dimensional SiC with monolayer or bilayer metallic 1T-phase MoS2 contacts. Because of the wide bandgap of SiC, the corresponding DG SBFETs can weaken the short channel effect. The calculated transfer characteristics also meet the standard of the high performance transistor summarized by international technology road-map for semiconductors. Moreover, the bilayer metallic 1T-phase MoS2 contacts in three stacking structures all can further raise the ON-state currents of DG SiC SBFETs in varying degrees. The above results are helpful and instructive for design of short channel transistors in the future.

Accession Number: WOS:000720099600001

ISSN: 1674-1056

eISSN: 2058-3834

Full Text: https://iopscience.iop.org/article/10.1088/1674-1056/abeee0



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