A Model of Dual Fabry-Perot Etalon-Based External-Cavity Tunable Laser Us...
Internal motion within pulsating pure-quartic soliton molecules in a fibe...
Enhanced light emission of germanium light-emitting-diode on 150 mm germa...
The Fabrication of GaN Nanostructures Using Cost-Effective Methods for Ap...
Negative-to-Positive Tunnel Magnetoresistance in van der Waals Fe3GeTe2/C...
Quantum Light Source Based on Semiconductor Quantum Dots: A Review
A High-Reliability RF MEMS Metal-Contact Switch Based on Al-Sc Alloy
Development of a Mode-Locked Fiber Laser Utilizing a Niobium Diselenide S...
Development of Multiple Fano-Resonance-Based All-Dielectric Metastructure...
Traffic Vibration Signal Analysis of DAS Fiber Optic Cables with Differen...
官方微信
友情链接

Study of strain evolution mechanism in Ge1_xSnx materials grown by low temperature molecular beam epitaxy

2021-11-25

 

Author(s): Wan, FS (Wan, Fengshuo); Xu, C (Xu, Chi); Wang, XY (Wang, Xiaoyu); Xu, GY (Xu, Guoyin); Cheng, BW (Cheng, Buwen); Xue, CL (Xue, Chunlai)

Source: JOURNAL OF CRYSTAL GROWTH Volume: 577 Article Number: 126399 DOI: 10.1016/j.jcrysgro.2021.126399 Published: JAN 1 2022

Abstract: Ge1-xSnx materials with constant and step-graded compositions have been successfully grown on Ge/Si(0 0 1) substrates by using low temperature molecular beam epitaxy (LT-MBE). It has been observed that both completely strained and partially relaxed GeSn materials with the same composition could be formed within the same sample, without adjusting any growth parameters. The residual in-plane strain in GeSn changes in a specific pattern from the GeSn/Ge interface towards the surface. The lower section of the GeSn material remains fully strained and free of dislocations, while most of the threading dislocations are located in the upper section of the layer, causing considerable strain relaxation within this section while maintaining the composition unchanged. This behavior could be explained by kinetic roughening and dislocation generation mechanisms at low temperatures and is remarkably different from GeSn materials grown by chemical vapor deposition (CVD), which exhibit a gradual strain relaxation process as growth continues. This work contributes to the fundamental understanding of the strain relaxation mechanisms of GeSn materials grown by MBE, which is instructive for improving the material quality in the future.

Accession Number: WOS:000718377900001

ISSN: 0022-0248

eISSN: 1873-5002

Full Text: https://www.sciencedirect.com/science/article/pii/S0022024821003742?via%3Dihub



关于我们
下载视频观看
联系方式
通信地址

北京市海淀区清华东路甲35号(林大北路中段) 北京912信箱 (100083)

电话

010-82304210/010-82305052(传真)

E-mail

semi@semi.ac.cn

交通地图
版权所有 中国科学院半导体研究所

备案号:京ICP备05085259-1号 京公网安备110402500052 中国科学院半导体所声明