Author(s): Su, Y (Su, Yue); Geng, ZX (Geng, Zhaoxin); Fang, WH (Fang, Weihao); Lv, XQ (Lv, Xiaoqing); Wang, SC (Wang, Shicai); Ma, ZT (Ma, Zhengtai); Pei, WH (Pei, Weihua)

Source: MICROMACHINES Volume: 12 Issue: 2 Article Number: 121 DOI: 10.3390/mi12020121 Published: FEB 2021

Abstract: Nanoimprint technology is powerful for fabricating nanostructures in a large area. However, expensive equipment, high cost, and complex process conditions hinder the application of nano-imprinting technology. Therefore, double-layer self-priming nanoimprint technology was proposed to fabricate ordered metal nanostructures uniformly on 4-inch soft and hard substrates without the aid of expensive instruments. Different nanostructure (gratings, nanoholes and nanoparticles) and different materials (metal and MoS2) were patterned, which shows wide application of double-layer self-priming nanoimprint technology. Moreover, by a double-layer system, the width and the height of metal can be adjusted through the photoresist thickness and developing condition, which provide a programmable way to fabricate different nanostructures using a single mold. The double-layer self-priming nanoimprint method can be applied in poor condition without equipment and be programmable in nanostructure parameters using a single mold, which reduces the cost of instruments and molds.

Accession Number: WOS:000622842400001

PubMed ID: 33498873

Author Identifiers:

Author        Web of Science ResearcherID        ORCID Number

geng, zhaoxin                  0000-0003-0917-0391

eISSN: 2072-666X

Full Text: https://www.mdpi.com/2072-666X/12/2/121