Robust anomalous Hall effect and temperature-driven Lifshitz transition in Weyl semimetal Mn3Ge
Author(s): Wang, XL (Wang, Xiaolei); Pan, D (Pan, Dong); Zeng, QQ (Zeng, Qingqi); Chen, X (Chen, Xue); Wang, HL (Wang, Hailong); Zhao, D (Zhao, Duo); Xu, ZY (Xu, Zhiyang); Yang, QN (Yang, Qianqian); Deng, JX (Deng, Jinxiang); Zhai, TR (Zhai, Tianrui); Wu, GH (Wu, Guangheng); Liu, EK (Liu, Enke); Zhao, JH (Zhao, Jianhua)
Source: NANOSCALE Volume: 13 Issue: 4 Pages: 2601-2608 DOI: 10.1039/d0nr07946d Published: JAN 28 2021
Abstract: Topological Weyl semimetals have attracted considerable interest because they manifest underlying physics and device potential in spintronics. Large anomalous Hall effect (AHE) in non-collinear antiferromagnets (AFMs) represents a striking Weyl phase, which is associated with Bloch-band topological features. In this work, we report robust AHE and Lifshitz transition in high-quality Weyl semimetal Mn3Ge thin film, comprising stacked Kagome lattice and chiral antiferromagnetism. We successfully achieved giant AHE in our Mn3Ge film, with a strong Berry curvature enhanced by the Weyl phase. The enormous coercive field H-C in our AHE curve at 5 K reached an unprecedented 5.3 T among hexagonal Mn3X systems. Our results provide direct experimental evidence of an electronic topological transition in the chiral AFMs. The temperature was demonstrated to play an efficient role in tuning the carrier concentration, which could be quantitatively determined by the two-band model. The electronic band structure crosses the Fermi energy level and leads to the reversal of carrier type around 50 K. The results not only offer new functionality for effectively modulating the Fermi level location in topological Weyl semimetals but also present a promising route of manipulating the carrier concentration in antiferromagnetic spintronic devices.
Accession Number: WOS:000614867500040
PubMed ID: 33481982
Author Identifiers:
Author Web of Science ResearcherID ORCID Number
Wang, Xiaolei 0000-0002-6964-2453
Pan, Dong 0000-0003-2067-6983
ISSN: 2040-3364
eISSN: 2040-3372
Full Text: https://pubs.rsc.org/en/content/articlelanding/2021/NR/D0NR07946D#!divAbstract