A Model of Dual Fabry-Perot Etalon-Based External-Cavity Tunable Laser Us...
Internal motion within pulsating pure-quartic soliton molecules in a fibe...
Enhanced light emission of germanium light-emitting-diode on 150 mm germa...
The Fabrication of GaN Nanostructures Using Cost-Effective Methods for Ap...
Negative-to-Positive Tunnel Magnetoresistance in van der Waals Fe3GeTe2/C...
Quantum Light Source Based on Semiconductor Quantum Dots: A Review
A High-Reliability RF MEMS Metal-Contact Switch Based on Al-Sc Alloy
Development of a Mode-Locked Fiber Laser Utilizing a Niobium Diselenide S...
Development of Multiple Fano-Resonance-Based All-Dielectric Metastructure...
Traffic Vibration Signal Analysis of DAS Fiber Optic Cables with Differen...
官方微信
友情链接

Impact of defect and doping on the structural and electronic properties of monolayer boron phosphide

2021-02-20

 

Author(s): Islam, MR (Islam, Md. Rasidul); Liu, K (Liu, Kong); Wang, ZJ (Wang, Zhijie); Qu, SC (Qu, Shengchun); Zhao, C (Zhao, Chao); Wang, XH (Wang, Xiaohui); Wang, ZG (Wang, Zhanguo)

Source: CHEMICAL PHYSICS Volume: 542 Article Number: 111054 DOI: 10.1016/j.chemphys.2020.111054 Published: FEB 1 2021

Abstract: The structural and electronic properties of various defects and doping effects in the monolayer BP have been systematically investigated using density-functional theory (DFT). It is shown that the monolayer BP is a planar compound with a direct bandgap value of 0.87 eV. For the B vacancy, the direct bandgap values are 0.912 eV, whereas the indirect bandgap value is 0.852 eV for the P vacancy. The structure remains a direct bandgap semiconductor, and the bandgap values are 0.53 eV, 0.72 eV, and 0.68 eV, respectively, for B anti-site, P anti-site, and exchange defects. Finally, we have found the direct bandgap values of 0.91 eV, 0.93 eV, and 0.96 eV with Al, Ga, and In dopant atoms into the monolayer BP structure, respectively. These results provide strategies on modifying the properties of monolayer BP, which will be favorable to the novel optoelectronic device applications.

Accession Number: WOS:000609493100004

ISSN: 0301-0104

eISSN: 1873-4421

Full Text: https://www.sciencedirect.com/science/article/pii/S0301010420311794?via%3Dihub



关于我们
下载视频观看
联系方式
通信地址

北京市海淀区清华东路甲35号(林大北路中段) 北京912信箱 (100083)

电话

010-82304210/010-82305052(传真)

E-mail

semi@semi.ac.cn

交通地图
版权所有 中国科学院半导体研究所

备案号:京ICP备05085259-1号 京公网安备110402500052 中国科学院半导体所声明